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High-purity nickel membrane gas filter designed for ultraclean processes in semiconductor and analytical gas systems, using VCR-style fittings. Model: WG3NS2RR2 Type: Inline gas filter (Ni membrane, Mini NF series) Fitting: 1/4″ VCR male inlet/outlet Filter Membrane: Nickel Housing: 316L stainless steel Length: 127 mm (5.00″) Particle Removal: ≥ 0.0015 µm; ≥ 99.9999999% removal at 120 SLM flow (9-log reduction) Initial Cleanliness: ≤ 0.03 particles/L for ≥ 0.01 µm particles Maximum Operating Pressure: 16.2 MPa (2346 psid); forward/reverse differential 3.3 MPa (485 psid) @ 20 °C Maximum Temperature: 400 °C (inert gases) Internal Finish: ≤ 5 µin Ra Leak Rating: ≤ 9 × 10⁻¹⁰ Pa·m³/s Applications: Ultra-pure gas delivery, high-temperature/reactive gas systems, gas panels and semiconductor processes Please review pictures carefully and let us know if you have any questions!
Condition: Used
Weight: 0.10
Depth: 4.00
Length: 6.00
Width: 4.00
SKU: 4374 4.S10.1.3D